Single mask dual damascene processes

Microelectronic Engineering

Volumn 85, Issue 3, 2008, Pages 599-602

  Perng, Dung Ching ^a   Fang, Jia Feng ^a   Chen, Jhin Wei ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Copper interconnect; Dual damascene; Mask; Misalignment; Phase shift mask; Single mask dual damascene process

Indexed keywords

DIELECTRIC MATERIALS; IMAGE ANALYSIS; IMAGE RECONSTRUCTION; PATTERN RECOGNITION; PHOTORESISTS;

DAMASCENE PROCESSES; OPTICAL PROXIMITY CORRECTION; TRENCH MISALIGNMENT;

MASKS;

EID: 39149145548     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.11.003     Document Type: Article

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