Lithographic manufacturing robustness analysis for as drawn patterns

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 1003-1007

  Melvin III, Lawrence S ^a   Yan, Qiliang ^a   Kielhorn, William F ^a  

^a SYNOPSYS INC   (United States)

Author keywords

Design; FSM; MSM; OPC; Photolithography; RET; Spatial frequency

Indexed keywords

DESIGN; MATHEMATICAL MODELS; NATURAL FREQUENCIES; ROBUSTNESS (CONTROL SYSTEMS); SENSITIVITY ANALYSIS;

FSM; MSM; OPC; RET; SPATIAL FREQUENCY;

LITHOGRAPHY;

EID: 33646018044     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.243     Document Type: Article

References (6)

1. Santarini M. Collaboration seen as key to DFM, but experts say time is past for just talk. EE Times 3 December (2004). Available from:
2. Wilson R., and Lammers D. Heavy rules hold back 90-nm yield. EE Times 28 March (2005). Available from:
3. Rieger M., and Stirniman J. Proc. SPIE 2726 (1996)
4. Melvin III L.S., Shiely J.P., and Yan Q. Use of optical defocus components to investigate and improve pattern spatial frequency characteristics for more robust layouts. J. Vac. Sci. Technol. B 2 6 (2005) 2631-2635
5. Goodman J.W. Introduction to Fourier Optics (1996), McGraw-Hill, New York p. 56
6. Melvin, Shiely, Yan, Proc. SPIE Int. Soc. Opt. Eng. 5756, 255-261.