Patterned wafer defect density analysis of step and flash imprint lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 1, 2008, Pages 151-155

  McMackin, I ^a   Martin, W ^a   Perez, J ^a   Selinidis, K ^a   Maltabes, J ^a   Xu, F ^a   Resnick, D ^a   Sreenivasan, S V ^a,b  

^a MOLECULAR IMPRINTS INC   (United States)

^b UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

E-BEAM INSPECTION; EXPOSURE TOOLS; INSPECTION TOOL; STEP AND FLASH IMPRINT LITHOGRAPHY (S-FIL);

CMOS INTEGRATED CIRCUITS; COST EFFECTIVENESS; LITHOGRAPHY; SILICON WAFERS;

DEFECT DENSITY;

EID: 38849163066     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2825164     Document Type: Article

References (8)

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