Electrochemical deposition of Te and electroless deposition of Se nanoparticles in etched tracks of Au+ ions in SiO2 layer on n-Si(1 0 0) wafers

Materials Science and Engineering: B

Volumn 147, Issue 2-3, 2008, Pages 271-275

  Ivanova, Yu A ^a   Ivanou, D K ^a   Streltsov, E A ^a   Fedotov, A K ^a  

^a BELARUSIAN STATE UNIVERSITY   (Belarus)

Author keywords

Deposition; Nanopores; Selenium; Silicon; Tellurium

Indexed keywords

ELECTROCHEMISTRY; ELECTRODEPOSITION; ELECTROLESS PLATING; GOLD; NANOPARTICLES; NANOPORES; POSITIVE IONS; SELENIUM; SILICA; SILICON WAFERS;

BASE DIAMETERS; ELECTROCHEMICAL DEPOSITION;

TELLURIUM;

EID: 38749146301     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2007.09.019     Document Type: Article

References (18)

1. Fink D., Alegaonkar P.S., Petrov A.V., Wilhelm M., Szimkowiak P., Behar M., Sinha D., Fahrner W.R., Hoppe K., and Chadderton L.T. Nucl. Instrum. Methods B 236 (2005) 11
2. Fink D., Sinha D., Opitz-Coutureau J., Petrov A.V., Demyanov S.E., Fahrner W.R., Hoppe K., Fedotov A.K., Chadderton L.T., and Berdinsky A.S. In: Borisenko V.E., Gaponenko S.V., and Gurin V.S. (Eds). Physics, Chemistry and Application of Nanostructures (2005), World Scientific Pubs 474
3. Ivanou D.K., Streltsov E.A., Fedotov A.K., Mazanik A.V., Fink D., and Petrov A. Thin Solid Films 490 (2005) 154
4. Yu.A. Ivanova, D.K. Ivanou, E.A. Streltsov, A.K. Fedotov, S.E. Demyanov, A.V. Petrov, E.Yu. Kaniukov, D. Fink, J. Mater.Sci., in press.
5. Ubara H., Imura T., and Hiraki A. Solid State Commun. 50 (1984) 673
6. Niwa D., Takano N., Yamada T., and Osaka T. Electrochim. Acta 48 (2003) 195
7. Ivanova Yu.A., Ivanou D.K., and Streltsov E.A. Electrochim. Acta 52 (2007) 5213
8. Gunawardena G., Hills G., Montenegro I., and Scharifker B. J. Electroanal. Chem. 138 (1982) 225
9. Budevski E., Staikov G., and Lorenz W.J. Electrochemical Phase Formation and Growth-An Introduction to the Initial Stages of Metal Deposition (1996), VCH, Weinheim
10. Ehlers C., König U., Staikov G., and Schultze J.W. Electrochim. Acta 47 (2001) 379
11. Oskam G., Long J.G., Natarajan A., and Searson P.C. J. Phys. D: Appl. Phys. 31 (1998) 1927
12. Ji Ch., Oskam G., and Searson P.C. Surf. Sci. 492 (2001) 115
13. Krumm R., Guel B., Schmitz C., and Staikov G. Electrochim. Acta 45 (2000) 3255
14. Wang Ch., Lei J., Bjeelkevig C., Rudenja S., Magtoto N., and Kelber J. Thin Solid Films 445 (2003) 72
15. Ivanov D.K., Osipovich N.P., Poznyak S.K., and Streltsov E.A. Russ. J. Electrochem. 40 (2004) 1044
16. Bouroushian M., Kosanovic T., Loizos Z., and Spyreliss N. Electrochem. Commun. 2 (2000) 281
17. Emsley J. The Elements (1991), Clarendon Press, Oxford
18. Al-Ani S.K., Al-Delami M.N., Abdul A.H., and Jawher H.M. Int. J. Electron. 69 (1990) 87