Effect of gas flow rates on PECVD-deposited nanocrystalline silicon thin film and solar cell properties

Solar Energy Materials and Solar Cells

Volumn 92, Issue 4, 2008, Pages 385-392

  Chowdhury, Amartya ^a   Mukhopadhyay, Sumita ^a   Ray, Swati ^a  

^a DEPARTMENT OF MATERIALS SCIENCE   (India)

Author keywords

Gas flow rate; Nanocrystalline silicon; PECVD; TEM

Indexed keywords

FLOW OF GASES; PLASMA DENSITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SOLAR CELLS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

CRYSTALLINE VOLUME FRACTIONS; GAS FLOW RATE; OPTOELECTRONIC PROPERTIES; PLASMA EXCITATION FREQUENCY;

NANOCRYSTALLINE SILICON;

EID: 38649113589     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2007.09.013     Document Type: Article

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