Nanostructure VO2 thin films for microbolometer

Cailiao Yanjiu Xuebao/Chinese Journal of Materials Research

Volumn 21, Issue 6, 2007, Pages 609-612

  He, Shaowei ^a,b   Huang, Ying ^a,b   Dai, Jun ^a,b   Lai, Jianjun ^a,b   Wang, Xingzhi ^a   Yi, Xinjian ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Inorganic non metallic materials; Nano VO2 thin films; Temperature coefficient of resistance (TCR); Uncooled infrared detector

Indexed keywords

BOLOMETERS; ELECTRIC RESISTANCE; INFRARED DETECTORS; MICROSTRUCTURE; NONMETALLIC MATERIALS; REACTIVE SPUTTERING; THIN FILMS; VANADIUM COMPOUNDS;

HEAT SENSITIVE MATERIAL; INORGANIC NONMETALLIC MATERIALS; MICROBOLOMETER; NANO VANADIUM DIOXIDE THIN FILMS; REACTION ION SPUTTERING; TEMPERATURE COEFFICIENT OF RESISTANCE (TCR); UNCOOLED INFRARED DETECTOR;

NANOSTRUCTURED MATERIALS;

EID: 38649086432     PISSN: 10053093     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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