Nickel/hydrogenated amorphous carbon composite films deposited in acetylene/argon microwave plasma discharge

Reviews on Advanced Materials Science

Volumn 15, Issue 2, 2007, Pages 127-133

  Kukielka S ^a,b   Gulbinski W ^a   Pauleau, Y ^b   Dub, S N ^c   Grob, J J ^d  

^a KOSZALIN UNIVERSITY OF TECHNOLOGY   (Poland)

^b GRENOBLE INSTITUTE OF TECHNOLOGY   (France)

^c BAKUL INSTITUTE FOR SUPERHARD MATERIALS   (Ukraine)

^d Faculté de Médecine   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS CARBON; CRYSTAL STRUCTURE; GRAIN SIZE AND SHAPE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; SPUTTER DEPOSITION; STAINLESS STEEL;

LOAD-DISPLACEMENT; MICROWAVE PLASMA DISCHARGE; RADIUS OF CURVATURE;

COMPOSITE FILMS;

EID: 38549151335     PISSN: 16065131     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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