Characteristics of copper/carbon and nickel/carbon composite films produced by microwave plasma-assisted deposition techniques from argon-methane gas mixtures

Surface and Coatings Technology

Volumn 188-189, Issue 1-3 SPEC.ISS., 2004, Pages 484-488

  Pauleau, Yves ^a   Thiery F ^a   Latrasse, L ^a   Dub, S N ^b  

^a GRENOBLE INSTITUTE OF TECHNOLOGY   (France)

^b BAKUL INSTITUTE FOR SUPERHARD MATERIALS   (Ukraine)

Author keywords

Carbon; Composite film; Copper; Mechanical properties; Microstructure; Nickel; Nickel carbide; Plasma assisted deposition

Indexed keywords

CHEMICAL VAPOR DEPOSITION; GRAIN SIZE AND SHAPE; MICROWAVES; NICKEL; RESIDUAL STRESSES; SILICON; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

FACE-CENTERED CUBIC (FCC); MICROWAVE PLASMA-ASSISTED CHEMICAL VAPOR DEPOSITION; NANOIDENTATION MEASUREMENTS; SPUTTER-DEPOSITION;

COMPOSITE MATERIALS;

COATING; FILM; HARDNESS; MICROWAVE RADIATION; PLASMA TREATMENT;

EID: 14644404977     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.08.059     Document Type: Article

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