Growth of carbon/nickel multilayer for X-ray-UV optics by RF reactive magnetron sputtering

Applied Surface Science

Volumn 148, Issue 3, 1999, Pages 142-146

  Georgescu, G ^b   Nelea, V ^b   Ulmeanu, M ^b   Ghica, C ^b   Nastase, N ^a  

^a NATIONAL INSTITUTE OF MATERIALS PHYSICS   (Romania)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON; CRYSTAL MICROSTRUCTURE; FILM GROWTH; MAGNETRON SPUTTERING; NICKEL; OPTICS; SUPERLATTICES; TRANSMISSION ELECTRON MICROSCOPY; X RAYS;

LAYERED SYNTHETIC MICROSTRUCTURES; REACTIVE MAGNETRON SPUTTERING; X RAY REFLECTION; X RAY ULTRAVIOLET OPTICS;

MULTILAYERS;

EID: 0032676101     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00219-6     Document Type: Article

References (6)

1. H.P. Klug, L.E. Alexander, X-Ray Diffraction Procedures, 2nd edn., Wiley, 1990.
2. J.M. Cowley, Diffraction Physics, North-Holland, Amsterdam, 1981.
3. D.R. McLachlan et al., in: Sputtering and Dry Etching Technology for VLSI and ULSI Devices, Materials Research Corp., 1985.
4. K.B. Youn, C. Sella, R. Barchewitz, M. Arbaoui, N. Alehyane, Absolute reflectivity measurements of multilayer mirrors in the soft X-ray region, in: E.-E. Koch, G. Schmal (Eds.), Soft X-Ray Optics and Technology, Proc. SPIE, 733 (1987) 316.
5. Vinogradov A.V., Zeldovich B.Ya. X-ray and far UV multilayer mirrors: principles and possibilities. Appl. Opt. 16:1977;89.
6. Pardo B., Bridou F., Maaza M. Reflectometrie X et diffusion aux petites angles. Journal de Physique IV France. 6:1996;351-366.