Inverse design for phase mask lithography

Optics Express

Volumn 16, Issue 2, 2008, Pages 663-670

  Rinne, James W ^a   Gupta, Sidhartha ^a   Wiltzius, Pierre ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTIVE OPTICS; GENETIC ALGORITHMS; LITHOGRAPHY; PERIODIC STRUCTURES;

HELICES; PHASE MASK LITHOGRAPHY;

OPTICAL DESIGN;

ARTICLE; COMPUTER AIDED DESIGN; COMPUTER SIMULATION; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; METHODOLOGY; PHOTOGRAPHY; REFRACTOMETRY; THEORETICAL MODEL;

COMPUTER SIMULATION; COMPUTER-AIDED DESIGN; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; MODELS, THEORETICAL; PHOTOGRAPHY; REFRACTOMETRY;

EID: 38549143172     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.16.000663     Document Type: Article

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