New realization method for three-dimensional photonic crystal in optical wavelength region

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 35, Issue 7 SUPPL. B, 1996, Pages

  Noda, Susumu ^a   Yamamoto, Noritsugu ^a   Sasaki, Akio ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Microfabrication; Photonic bandgap; Photonic crystal; Three dimensional structure; Wafer bonding

Indexed keywords

BONDING; DRY ETCHING; ELECTRON BEAM LITHOGRAPHY; FABRICATION; LASER BEAMS; MOLECULAR BEAM EPITAXY; PHOTOLITHOGRAPHY; PHOTONS; REACTIVE ION ETCHING; SEMICONDUCTING GALLIUM COMPOUNDS; THREE DIMENSIONAL;

LASER BEAM DEFLECTION; MICROFABRICATION; MICROPROCESSING; OPTICAL WAVELENGTH REGION; PHOTONIC BANDGAP; PHOTONIC CRYSTALS; WAFER BONDING;

CRYSTALS;

EID: 0030189725     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.l909     Document Type: Article

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