Influence of ICP etching damage on the brittle-fracture strength of single-crystal silicon

Zairyo/Journal of the Society of Materials Science, Japan

Volumn 56, Issue 10, 2007, Pages 920-925

  Izumi, Satoshi ^a   Kubodera, Yusuke ^a   Sakai, Shinsuke ^a   Miyajima, Hiroshi ^b   Murakami, Kenji ^b   Isokawa, Tosniniko ^b  

^a UNIVERSITY OF TOKYO   (Japan)

^b OLYMPUS CORPORATION   (Japan)

Author keywords

Bending test; Brittle fracture; Finite element method; Fracture mechanics; MEMS; Weibull distribution

Indexed keywords

BRITTLE STRENGTH; ETCHING DAMAGE; NOTCHING ROUGHNESS;

BENDING TESTS; BRITTLE FRACTURE; FINITE ELEMENT METHOD; MEMS; WEIBULL DISTRIBUTION;

FRACTURE MECHANICS;

EID: 38549096485     PISSN: 05145163     EISSN: None     Source Type: Journal    
DOI: 10.2472/jsms.56.920     Document Type: Article

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