Model-based OPC/DRC considering local flare effects

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 1, 2004, Pages 451-458

  Futatsuya, Hiroki ^a   Yao, Teruyoshi ^a   Osawa, Morimi ^a   Ogino, Kozo ^a   Hoshino, Hiromi ^a   Arimoto, Hiroshi ^a   Machida, Yasuhide ^a   Asai, Satoru ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

DRC; Local flare; OPC; Scattered light

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; ELECTROMAGNETIC WAVE ATTENUATION; MASKS; MATHEMATICAL MODELS; OPTICAL SYSTEMS; PHASE SHIFT; PHOTOLITHOGRAPHY; PRINTING;

DESIGN RULES CHECKING (DRC); LOCAL FLARE CORRECTION; LOCAL FLARE EFFECTS; OPTICAL PROXIMITY CORRECTIONS (OPC);

LIGHT SCATTERING;

EID: 3843152628     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535076     Document Type: Conference Paper

References (8)

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