Model-based OPC for phase shifter edge lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 II, Issue , 2002, Pages 1148-1155

  Futatsuya, Hiroki ^a   Chijimatsu, Tatsuo ^a   Minami, Takayoshi ^a   Tsujimura, Ryo ^a   Komura, Yoshihisa ^a   Ito, Yoshio ^a   Asai, Satoru ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

Alternating PSM; Double exposure; Model based OPC

Indexed keywords

COMPUTER SIMULATION; MASKS; PARALLEL PROCESSING SYSTEMS; PATTERN MATCHING; PHASE SHIFTERS; SILICON WAFERS;

OPTICAL PROXIMITY CORRECTION (OPC);

PHOTOLITHOGRAPHY;

EID: 0036413554     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474495     Document Type: Conference Paper

References (2)

1. Olivier Toublan, Emile Sahouria, Nick Cobb, Thuy Do, Tom Donnelly, Yuri Granik, Frank Schellenberg and Patrick Schiavone, "Phase Aware Proximity Correction for Advanced Masks", Proc. SPIE Vol. 4000, p160 (2000).
2. Hiroki Futatsuya, Tatsuo Chijimatsu, Satoru Asai, and Isamu Hanyu, "Development of Lithographic DRC Technique for Interactive Use and Batch Processing", Proc. SPIE Vol. 3679, p659 (1999).