Local Flare Effects and Correction in ArF Lithography

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 2003, Pages 43-44

  Yao, Teruyoshi ^a   Osawa, Morimi ^a   Minami, Takayoshi ^a   Yamamoto, Norihiro ^a   Aoyama, Hajime ^a   Okuda, Genshi ^a   Sawano, Toshio ^a   Kamatsuki, Issei ^a   Sugimoto, Fumitoshi ^a   Futatsuya, Hiroki ^a   Kobayashi, Katsuyoshi ^a   Ogino, Kozo ^a   Hoshino, Hiromi ^a   Machida, Yasuhide ^a   Arimoto, Hiroshi ^a   Asai, Satoru ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY; OPTICAL TRANSFER FUNCTION; PARAMETER ESTIMATION; PATTERN MATCHING; HYBRID SYSTEMS; MASKS;

FLARE EFFECTS;

LIGHT SCATTERING; EXPOSURE METERS;

ARF LITHOGRAPHY; EFFECT MODEL; EXPOSURE TOOL; GAUSSIAN POINT; LINE WIDTH VARIATION; LINE-WIDTH; LOCAL FLARE; MASK PATTERN CORRECTION; MID-RANGE FLARE; POINT-SPREAD FUNCTION;

EID: 0141649578     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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