Novel polychromatic measurement technique for determining the dissolution rate of very thin resist films

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4689 I, Issue , 2002, Pages 213-222

  Robertson, Stewart A ^a   Kang, Doris ^a   Scheer, Steven A ^b   Brodsky, Colin J ^b  

^a SHIPLEY COMPANY   (United States)

^b LLC   (United States)

Author keywords

Development rate monitor; Multi wavelength; Polychromatic; Thin resist film

Indexed keywords

LIGHT REFLECTION; SURFACE WAVES; THIN FILMS; WAVE EFFECTS;

THIN RESIST FILMS;

PHOTORESISTS;

EID: 0036031564     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.473460     Document Type: Article

References (15)

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