Simulation of the coupled thermal/optical effects for liquid immersion micro/nanolithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 1, 2004, Pages 415-427

  Baek, So Yeon ^a   Wei, Alexander ^b   Cole, Daniel C ^a   Nellis, Greg ^b   Yeung, Michael ^a   Abdo, Amr ^b   Engelstad, Roxann ^b  

^a BOSTON UNIVERSITY   (United States)

^b University of Wisconsin Madison   (United States)

Author keywords

High NA; Liquid immersion; Optical lithography; Simulation

Indexed keywords

HIGH NUMERICAL APERTURE (NA); IMAGING SIMULATIONS; IMMERSION LITHOGRAPHY; LIQUID IMMERSION;

COMPUTATIONAL FLUID DYNAMICS; COMPUTER SIMULATION; IMAGING SYSTEMS; MASKS; PHASE SHIFT; PHOTOLITHOGRAPHY; PRESSURE EFFECTS; PRINTING; TEMPERATURE DISTRIBUTION;

OPTICAL SYSTEMS;

EID: 3843132841     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537574     Document Type: Conference Paper

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