Electron-beam and emerging lithography for the magnetic recording industry

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 1, 2004, Pages 16-30

  Driskill Smith, A A G ^a  

^a SAN JOSE RESEARCH CENTER   (United States)

Author keywords

Electron beam lithography; Giant magnetoresistive thin film head; Magnetic recording; Nanoimprint lithography; Patterned media

Indexed keywords

CRITICAL DIMENSIONS (CD); NANOIMPRINT LITHOGRAPHY; PATTERNED MEDIA; THIN-FILM HEADS;

ELECTRON BEAMS; GIANT MAGNETORESISTANCE; MAGNETIC RECORDING; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; POLYMETHYL METHACRYLATES; POLYSTYRENES; SIGNAL TO NOISE RATIO; SUPERPARAMAGNETISM; SURFACE ROUGHNESS; THIN FILMS;

ELECTRON BEAM LITHOGRAPHY;

EID: 3843130638     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.536002     Document Type: Conference Paper

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