Magnetic properties of large-area particle arrays fabricated using block copolymer lithography

IEEE Transactions on Magnetics

Volumn 38, Issue 5 I, 2002, Pages 2541-2543

  Cheng, Joy Y ^a   Ross, C A ^a   Thomas, E L ^a   Smith, Henry I ^b   Lammertink, R G H ^c   Vancso, G J ^c  

^a Massachusetts Institute of Technology Cambridge   (United States)

^b USA   (United States)

^c UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

Activation volume; Block copolymer lithography; Cobalt nanoparticles; Self assembly

Indexed keywords

BLOCK COPOLYMERS; LITHOGRAPHY; MAGNETIC MATERIALS; SELF ASSEMBLY;

BLOCK COPOLYMER LITHOGRAPHY;

NANOSTRUCTURED MATERIALS;

EID: 0036761771     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMAG.2002.801926     Document Type: Article

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