Simulation technique for the PR flow process using a new viscous flow model

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 2, 2004, Pages 975-982

  Chung, Won Young ^a   Kim, Tai Kyung ^a   Yoon, Jin Young ^a   Kim, Hyun Woo ^a   Park, Young Kwan ^a   Kong, Jeong Taek ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

Contact patterning; PR flow; Simulation; Viscous flow model

Indexed keywords

ARRAYS; COMPUTER SIMULATION; HEAT TRANSFER; MATHEMATICAL MODELS; OPTIMIZATION; SCANNING ELECTRON MICROSCOPY; VISCOSITY;

CONTACT PATTERNING; PHOTORESIST FLOW; VIACOUS FLOW MODEL;

PHOTORESISTS;

EID: 3843130629     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.534809     Document Type: Conference Paper

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