Resolution limit for two-dimensional crossed-grating patterns projected by a coherent beam

Applied Optics

Volumn 42, Issue 16, 2003, Pages 3259-3267

  Unno, Yasuyuki ^a  

^a Canon Development Americas Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COHERENT LIGHT; IMAGE PROCESSING; PHASE SHIFT; PHOTORESISTS;

PHASE SHIFTING MASKS;

DIFFRACTION GRATINGS;

EID: 0042973883     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.42.003259     Document Type: Article

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