Study of the impact of illumination intensity distribution on resist parameter modification

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 3, 2004, Pages 1375-1386

  Kawamura, Daisuke ^a   Sato, Kazuya ^a   Mimotogi, Shoji ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

AutoTune; Illumination intensity distribution; Parameter tuning; PROLITH; Resist model parameters; Resist simulation

Indexed keywords

AUTOTUNE; ILLUMINATION INTENSITY DISTRIBUTION; PARAMETER TUNING; PROLITH; RESIST MODEL PARAMETERS; RESIST SIMULATION;

COMPUTER SIMULATION; ELECTROMAGNETIC WAVE DIFFRACTION; ERROR CORRECTION; LIGHTING; MATHEMATICAL MODELS; PARAMETER ESTIMATION; PATTERN RECOGNITION; PHASE SHIFT;

PHOTOLITHOGRAPHY;

EID: 3843126361     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535169     Document Type: Conference Paper

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