Printing 130 nm DRAM isolation pattern: Zernike correlation and tool improvement

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 1, 2001, Pages 229-240

  Van Schoot, Jan ^a   Seong, Nakgeuon ^b   Geh, Bernd ^c   Burkhardt, Martin ^a   Gräupner, Paul ^c   Reisinger, Gerd ^c   Rubingh, Rian ^a   Suddendorf, Manfred ^a   Finders, Jo ^a   Rikkers, Erwin ^a  

^a ASML   (Netherlands)

^b SAMSUNG Electronics   (South Korea)

^c CARL ZEISS SMT AG   (Germany)

Author keywords

Aberrations; ARTEMIS ; Circle of Litho; DRAM; Lenses; Optical Lithography

Indexed keywords

ABERRATIONS; DYNAMIC RANDOM ACCESS STORAGE; OPTICAL CORRELATION; OPTICAL RESOLVING POWER; PRINTED CIRCUITS; WAVEFRONTS;

LITHOGRAPHY TOOLS;

PHOTOLITHOGRAPHY;

EID: 18544367319     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.435723     Document Type: Article

References (11)

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8. M. Moers et al., "Application of the aberration ring test (ARTEMIS) to determine lens quality and predict its lithographic performance", SPIE Vol. 4346 (2001) to be published.
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10. Jo Finders et al., "Can DUV take us below 100nm?", SPIE Vol. 4346 (2001), to be published.
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