Will Darwin's law help us to improve our resist models?

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 I, Issue , 2003, Pages 291-302

  Tollkühn, Bernd ^a   Fühner, Tim ^a   Matiut, Daniela ^a   Erdmann, Andreas ^a   Semmler, Armin ^b   Küchler, Bernd ^b   Kókai, Gabriella ^c  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

^b INFINEON TECHNOLOGIES AG   (Germany)

^c UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

Genetic algorithm; Model calibration; Optical lithography simulation

Indexed keywords

ACIDS; CALIBRATION; COMPUTER SIMULATION; DIFFUSION; GENETIC ALGORITHMS; MATHEMATICAL MODELS;

MODEL CALIBRATION; PHOTOGENERATED ACID; QUENCHER BASE; RESIST MODEL PARAMETERS;

PHOTORESISTS;

EID: 0141611753     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485078     Document Type: Conference Paper

References (17)

1. Tollkuehn, B., Erdmann, A., Kivel, N., Robertson, S., Kang, D., Hansen, S., Fumar-Pici, A., Chiou, T., Hoppe, W., "New methods to calibrate simulation parameters for chemically amplified resists" Proc. SPIE 4691 (2002), 1168
2. Matiut, D., Erdmann, A., Tollkuehn, B., Semmler, A., New models for the simulation of post-exposure bake of chemically amplified resists" Proc. SPIE, this volume
3. Erdmann, A., Henke, W., Robertson, S., Richter, E., Tolkühn, B., Hoppe, W., "Comparison of Simulation Approaches for Chemically Amplified Resists", Proc. SPIE 4404 (2001), 99
4. Fukuda, H., Hattori, K., Hagiwara, T., "Impact of Acid/Quencher Behavior on Lithography Performance", Proc. SPIE 4346 (2001), 319
5. Robertson, S., Mack, C.A., Maslow, M., "Towards a Universal Resist Dissolution Model for Lithography Simulation", Proc. SPIE 4404 (2001), 111
6. Petersen, J.S., Mack, C.A., Thackersay, J.W., Sinta, R., Fedynyshyn, T.H., Mori, J.M., Byers, J.D., Miller, D.A., "Characterization and modeling of a positive acting chemically amplified resist" Proc. SPIE 2438 (1995), 153
7. Hinsberg, W., Houle, F., Sanchez, M., Morrison, M., Wallraff, G., Larson, C., Hoffnagle, J., Brock, P., Breyta, G., "Effect of Resist Components on Image Spreading During Postexposure Bake of Chemically Amplified Resists", Proc. SPIE 3999 (2000), 148
8. Tollkuehn, B., Hoepfl, M., Eardmann, A., Majoni, S., Jess, M., "Automatic resist parameter calibration procedure for lithography simulation", Proc. SPIE 4404 (2001), 313
9. Nelder, J., Mead,R., "A simplex method for function minimization", The Computer Journal (|1965|, vol.7), 308
10. Charles Darwin. On the Origin of Species. Modern Library (Random House), New York, 1998. See also http://www.spacelab.net/catalj.
11. David E. Goldberg. Genetic Algorithms in Search, Optimization, and Machine Learning. Addison-Wesley, Reading, MA, 1989.
12. John H. Holland, Adaptation in Natural and Artificial Systems. The MIT Press, Cambridge, MA, 1992.
13. Christian Jacob. Illustrating Evolutionary Computation with Mathematica. Morgan Kaufmann, San Francisco, CA, 2001.
14. John R. Koza, Genetic Programming - On the Programming of Computers by Means of Natural Selection. The MIT Press, Cambridge, MA, 1992.
15. Ingo Rechenberg. Evolutionsstrategie. Friedrich Frommann Verlag, Stuttgart - Bad Cannstatt, 1973.
16. Fuard, D., Besacier, M., Schiavone, P., "Assessment of different simplified resist models", Proc SPIE 4691 (2002)
17. PWA is a commercial product of SIGMA-C: http:\www.sigma-c.com.