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Journal of the Electrochemical Society

Volumn 155, Issue 3, 2008, Pages

Dynamics of copper deposition onto silicon by galvanic displacement

(3) DaRosa, Calvin P a,b Iglesia, Enrique a Maboudian, Roya a

a University of California (United States)

b ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

BOUNDARY LAYERS; COPPER DEPOSITS; ELECTRODES; MASS TRANSFER; ROTATING DISKS; STOICHIOMETRY;

DEPOSITION RATE; GALVANIC DISPLACEMENT; SURFACE KINETIC CONTROL;

SILICON;

EID: 38349155009 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.2829907 Document Type: Article

Times cited : (17)

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