Computational experiments on optical coating production using monochromatic monitoring strategy aimed at eliminating a cumulative effect of thickness errors

Applied Optics

Volumn 46, Issue 28, 2007, Pages 6936-6944

  Tikhonravov, Alexander V ^a   Trubetskov, Michael K ^a   Amotchkina, Tatiana V ^a  

^a MOSCOW STATE UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; ERROR ANALYSIS; REFRACTIVE INDEX; SPREADSHEETS;

DIRECT OPTICAL MONITORING; MONOCHROMATIC MONITORING; SHUTTER DELAYS; THICKNESS ERRORS;

OPTICAL COATINGS;

EID: 38149134530     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.46.006936     Document Type: Article

References (26)

1. H. A. Macleod, Thin Film Optical Filters (McGraw-Hill, 1986).
2. H. Macleod, "Monitoring of optical coatings," Appl. Opt. 20, 82-89 (1981).
3. R. R. Willey, "Optical thickness monitoring sensitivity improvement using graphical methods," Appl. Opt. 26, 729-737 (1987).
4. B. T. Sullivan and J. A. Dobrowolski, "Deposition error compensation for optical multilayer coatings. I. Theoretical description," Appl. Opt. 31, 3821-3835 (1992).
5. A. Zoeller, M. Boos, R. Goetzelmann, H. Hagedorn, and W. Klug, "Substantial progress in optical monitoring by intermittent measurement technique," Proc. SPIE 5963, 105-113 (2005).
6. A. Zoeller, M. Boos, H. Hagedorn, W. Klug, and C. Schmitt, "High accurate in situ optical thickness monitoring for multilayer coatings," in Proceedings of the 47th Annual SVC Conference (Society of Vacuum Coaters, 2004), pp. 72-78.
7. P. Bousquet, A. Fornier, R. Kowalczyk, E. Pelletier, and P. Roche, "Optical filters: monitoring process allowing the auto-correction of thickness errors," Thin Solid Films 13, 285-290 (1972).
8. H. A. Macleod, "Turning value monitoring of narrow-band all-dielectric thin film optical filters," Opt. Acta 19, 1-28 (1972).
9. H. Macleod and D. Richmond, "The effect of errors in the optical monitoring of narrow-band all-dielectric thin film optical filters," Opt. Acta 21, 429-443 (1974).
10. H. Macleod and E. Pelletier, "Error compensation mechanisms in some thin-film monitoring systems," Opt. Acta 24, 907-930 (1977).
11. A. V. Tikhonravov and M. K. Trubetskov, "Automated design and sensitivity analysis of wavelength-division multiplexing filters," Appl. Opt. 41, 3176-3182 (2002).
12. F. Zhao, "Monitoring of periodic multilayers by the level method," Appl. Opt. 24, 3339-3342 (1985).
13. R. Willey, "Variation of band-edge position with errors in the monitoring of layer termination level for long- and short-wave pass filters," Appl. Opt. 38, 5447-5451 (1999).
14. A. Tikhonravov, M. Trubetskov, and T. Amotchkina, "Statistical approach to choosing a strategy of monochromatic monitoring of optical coating production," Appl. Opt. 45, 7863-7870 (2006).
15. C. J. van der Laan, "Optical monitoring of nonquarterwave stacks," Appl. Opt. 25, 753-760 (1986).
16. C.-C. Lee, K. Wu, C.-C. Kuo, and S.-H. Chen, "Improvement of the optical coating process by cutting layers with sensitive monitoring wavelengths," Opt. Express 13, 4854-4861 (2005).
17. B. Chun, C. K. Hwangbo, and J. S. Kim, "Optical monitoring of nonquarterwave layers of dielectric multilayer filters using optical admittance," Opt. Express 14, 2473-2480 (2006).
18. C. Holm, "Optical thin film production with continuous reoptimization of layer thicknesses," Appl. Opt. 18, 1978-1982 (1978).
19. L. Li and Y. Yen, "Wideband monitoring and measuring system for optical coatings," Appl. Opt. 28, 2890-2894 (1989).
20. J. A. Dobrowolski and A. Waldorf, "Manufacture of all-dielectric filters with layers of arbitrary thickness and refractive index," J. Opt. Soc. Am. 60, 725 (1970).
21. A. Tikhonravov and M. Trubetskov, "Eliminating of cumulative effect of thickness errors in monochromatic monitoring of optical coating production: theory," Appl. Opt. 46, 2084-2090 (2007).
22. A. V. Tikhonravov and M. K. Trubetskov, "Computational manufacturing as a bridge between design and production," Appl. Opt. 44, 6877-6884 (2005).
23. N. Kaiser and H. K. Pulker, "Some fundamentals of optical thin film growth," in Optical Interference Coatings, N. Kaiser and H. K. Pulker, eds. (Springer-Verlag, 2003), pp. 59-80.
24. D. Poitras, J. A. Dobrowolski, T. Cassidy, and S. Moisa, "Ion-beam etching for the precise manufacture of optical coatings," Appl. Opt. 42, 4037-4044 (2003).
25. P. Ma, J. A. Dobrowolski, F. Lin, C. Midwinter, and C. T. McElroy, "Long-wavelength polarizing cutoff filters for the 275-550-nm spectral region," Appl. Opt. 41, 3218-3223 (2002).
26. C. Clark and H. A. Macleod, "Errors and tolerances in optical coatings," in Proceedings of the 40th Annual SVC Conference (Society of Vacuum Coaters, 1997), pp. 274-279.