Improvement of the optical coating process by cutting layers with sensitive monitor wavelengths

Optics Express

Volumn 13, Issue 13, 2005, Pages 4854-4861

  Lee, Cheng Chung ^a   Wu, Kai ^a   Kuo, Chien Cheng ^a   Chen, Sheng Hui ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

BANDPASS FILTERS; COATING TECHNIQUES; CRYSTALS; DEPOSITION; MONITORING; NUMERICAL ANALYSIS; OPTICAL FILTERS; QUARTZ;

DEPOSITION AND FABRICATION; NARROW-BAND PASS FILTERS; OPTICAL MONITORING; THICKNESS COMPENSATION;

OPTICAL COATINGS;

EID: 22744453383     PISSN: 10944087     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OPEX.13.004854     Document Type: Article

References (7)

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3. B. Vidal, A. Fornier and E Pelletier, "Wideband optical monitoring of nonquarter wave multilayer filter", Appl. Opt. 18, 3851-3856 (1979).
4. H. A. Macleod, Thin-Film Optical Filters, 3rd ed. (IoP, Bristal, 2001).
5. Y. R. Chen, Monitoring of film growth by admittance diagram, Master Thesis of the National Central University, Taiwan (2004).
6. H. A. Macleod and E Pelletier, "Error compensation mechanisms in some thin film monitoring systems," Opt. Acta 24, 907-930 (1977)
7. H. A. Macleod, "Turning value monitoring of narrow-band all-dielectric thin-film optical filters," Opt. Acta, 19, 1-28 (1972).