Formation and electrical bistability properties of ZnO nanoparticles embedded in polyimide nanocomposites sandwiched between two C60 layers

Applied Physics Letters

Volumn 92, Issue 1, 2008, Pages

  Li, Fushan ^a   Kim, Tae Whan ^a   Dong, Wenguo ^a   Kim, Young Ho ^a  

^a Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON DIFFRACTION; TRANSMISSION ELECTRON MICROSCOPY; ZINC OXIDE;

CURRENT BISTABILITY; CURRENT-VOLTAGE HYSTERESIS; ELECTRICAL BISTABILITY; INDIUM TIN OXIDE; INDIUM TIN OXIDES;

POLYIMIDES;

EID: 38049066949     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2830617     Document Type: Article

References (20)

1. N. J. Craig, J. M. Taylor, E. A. Lester, C. M. Marcus, M. P. Hanson, and A. C. Gossard, Science SCIEAS 0036-8075 10.1126/science.1095452 304, 565 (2004).
2. R. J. Warburton, C. Schaflein, D. Haft, F. Bickel, A. Lorke, K. Karral, J. M. Garcia, W. Schoenfeid, and P. M. Petroff, Nature (London) NATUAS 0028-0836 10.1038/35016030 405, 926 (2000).
3. S. Coe, W.-K. Woo, M. Bawendi, and V. Bulovic, Nature (London) NATUAS 0028-0836 10.1038/nature01217 420, 800 (2002).
4. M. Kroutvar, Y. Ducommun, D. Heiss, M. Bichler, D. Schuh, G. Abstreiter, and J. J. Finley, Nature (London) NATUAS 0028-0836 10.1038/nature03008 432, 81 (2004).
5. V. L. Covin, M. C. Schlamp, and A. P. Alivisatos, Nature (London) NATUAS 0028-0836 10.1038/370354a0 370, 354 (1994).
6. J. Ouyang, C.-W. Chu, C. R. Szmanda, L. Ma, and Y. Yang, Nat. Mater. NMAACR 1476-1122 10.1038/nmat1269 3, 918 (2004).
7. T. W. Kim, D. C. Choo, J. H. Shim, and S. O. Kang, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1458685 80, 2168 (2002).
8. M. Kanoun, A. Souifi, T. Baron, and F. Mazen, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1751227 84, 5079 (2004).
9. L. P. Ma, J. Liu, and Y. Yang, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1473234 80, 2997 (2002).
10. L. Ma, S. Pyo, J. Ouyang, Q. Xu, and Y. Yang, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1556555 82, 1419 (2003).
11. H. P. Wang, S. Pigeon, R. Lzquierdo, and R. Martel, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2372688 89, 183502 (2006).
12. L. D. Bozano, B. W. Kean, V. R. Deline, J. R. Salem, and J. C. Scott, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1643547 84, 607 (2004).
13. J. H. Jung, J. Y. Jin, I. Lee, T. W. Kim, M. S. Jang, Y.-H. Kim, and S. Jin, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2185615 88, 112107 (2006).
14. J. H. Jung, J. H. Kim, T. W. Kim, H. G. Roh, and Y.-H. Kim, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2355465 89, 122110 (2006).
15. J. N. Haddock, X. Zhang, B. Domercq, and B. Kippelen, Org. Electron. OERLAU 1566-1199 10.1016/j.orgel.2005.06.002 6, 182 (2005).
16. R. C. Haddon, J. Am. Chem. Soc. JACSAT 0002-7863 10.1021/ja953881w 118, 3041 (1996).
17. Y.-H. Kim, G. F. Walker, J. Kim, and J. Park, J. Adhes. Sci. Technol. JATEE8 0169-4243 1, 331 (1987).
18. Y. Chung, H. P. Park, H. J. Jeon, C. S. Yoon, S. K. Kim, and Y.-H. Kim, J. Vac. Sci. Technol. B JVTBD9 0734-211X 10.1116/1.1624269 21, L9 (2003).
19. T. Kanbara, K. Shibata, S. Fujiki, Y. Kubozono, S. Kashino, T. Urisu, M. Sakai, A. Fujiwara, R. Kumashiro, and K. Tanigaki, Chem. Phys. Lett. CHPLBC 0009-2614 10.1016/j.cplett.2003.07.025 379, 223 (2003).
20. A. Kanwal and M. Chhowalla, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2388131 89, 203103 (2006).