Mechanism of 157 nm photodegradation of poly[4,5-difluoro-2,2- bis(trifluoromethyl)-1,3-dioxole-co-tetrafluoroethylene] (Teflon AF)

Macromolecules

Volumn 40, Issue 25, 2007, Pages 8954-8961

  Blakey, Idriss ^a   George, Graeme A ^b   Hill, David J T ^a   Liu, Heping ^a   Rasoul, Firas ^a   Rintoul, Llewelyn ^b   Zimmerman, Paul ^c   Whittaker, Andrew K ^a  

^a UNIVERSITY OF QUEENSLAND   (Australia)

^b QUEENSLAND UNIVERSITY OF TECHNOLOGY   (Australia)

^c SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIOXOLE UNIT; FREE RADICAL INTERMEDIATES; HEXAFLUOROACETONE;

COPOLYMERS; MASS SPECTROMETRY; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; PHOTODEGRADATION; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

POLYTETRAFLUOROETHYLENES;

EID: 37549061045     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma071549m     Document Type: Article

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