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Volumn 34, Issue 11, 2007, Pages 1498-1501
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Passive mode-locking in Nd:YAG laser using nanocrystalline silicon embedded in SiNx film
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Author keywords
Laser technique; Nanocrystalline silicon; Passive mode locking; Two photon absorption
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Indexed keywords
ANNEALING;
BAND STRUCTURE;
ENERGY GAP;
FUSED SILICA;
LIGHT ABSORPTION;
MAGNETRON SPUTTERING;
NANOCRYSTALLINE SILICON;
QUANTUM CONFINEMENT;
RELAXATION PROCESSES;
SILICON NITRIDE;
SOLID STATE LASERS;
X RAY DIFFRACTION ANALYSIS;
ENERGY BAND GAP;
LASER TECHNIQUE;
PASSIVE MODE LOCKING;
RADIO FREQUENCY (RF) MAGNETRON SPUTTERING;
SILICA GLASS;
THERMAL ANNEALING;
TWO PHOTON ABSORPTION;
LASER MODE LOCKING;
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EID: 37449013204
PISSN: 02587025
EISSN: None
Source Type: Journal
DOI: None Document Type: Article |
Times cited : (6)
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References (13)
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