Ultraviolet luminescence of Gd-doped a-SiXCYOZ:H films fabricated by plasma chemical vapor deposition

Materials Science and Engineering: B

Volumn 146, Issue 1-3, 2008, Pages 151-156

  Tyczkowski, J ^a   Delamar, M ^b,c  

^a LODZ UNIVERSITY OF TECHNOLOGY   (Poland)

^b UNIVERSITÉ PARIS DESCARTES   (France)

^c CNRS   (France)

Author keywords

Gadolinium; Hydrogenated silicon oxycarbide; Photoluminescence; Plasma deposition; Thin amorphous films; XPS spectroscopy

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ENERGY TRANSFER; GADOLINIUM COMPOUNDS; LIGHT ABSORPTION; PHOTOLUMINESCENCE; PLASMA DEPOSITION; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL STRUCTURES; HYDROGENATED SILICON OXYCARBIDE; NON RADIATIVE TRANSFER; THIN AMORPHOUS FILMS;

SILICON COMPOUNDS;

EID: 37449005204     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2007.07.028     Document Type: Article

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