Gadolinium-doped organosilicon films grown by plasma chemical vapor deposition

Surface and Coatings Technology

Volumn 116-119, Issue , 1999, Pages 629-633

  Tyczkowski, J ^a   Szymanowski, H ^a   Dargis, R ^a  

^a CENTRE OF MOLECULAR AND MACROMOLECULAR STUDIES   (Poland)

Author keywords

Gadolinium; Organosilicon films; Photoluminescence; Plasma chemical vapor deposition

Indexed keywords

FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GADOLINIUM COMPOUNDS; LIGHT ABSORPTION; LIGHT EMISSION; MICROANALYSIS; PHOTOLUMINESCENCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING; SILICONES;

HEXAMETHYLSILOXANE;

SEMICONDUCTING FILMS;

EID: 0039171147     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00195-4     Document Type: Article

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