Selective MOCVD of titanium oxide and zirconium oxide thin films using single molecular precursors on Si(1 0 0) substrates

Journal of Physics and Chemistry of Solids

Volumn 69, Issue 1, 2008, Pages 128-132

  Kang, B C ^a   Jung, D Y ^a   Fischer, R A ^b   Boo, J H ^a  

^a Sungkyunkwan University   (South Korea)

^b RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

A. Oxides; A. Thin film; B. Vapor deposition; D. Surface properties

Indexed keywords

HIGH TEMPERATURE EFFECTS; HYDROPHOBICITY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SILICON; SURFACE PROPERTIES; TITANIUM OXIDES; ZIRCONIA;

MOLECULAR PRECURSORS; TERMINAL GROUPS;

THIN FILMS;

EID: 37249031089     PISSN: 00223697     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jpcs.2007.08.008     Document Type: Article

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