Time dependent analysis of the resist deformation in thermal nanoimprint

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 6, 2007, Pages 2341-2345

  Hirai, Yoshihiko ^a   Onishi, Yuki ^b   Tanabe, Toshiaki ^a   Nishihata, Masayoshi ^a   Iwasaki, Takuya ^b   Kawata, Hiroaki ^a   Iriye, Yasuroh ^b  

^a Osaka City University   (Japan)

^b MIZUHO INFORMATION AND RESEARCH INSTITUTE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; COMPUTER SIMULATION; CONSTITUTIVE MODELS; FINITE ELEMENT METHOD;

DEMOLDING;

NANOIMPRINT LITHOGRAPHY;

EID: 37149056902     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2804429     Document Type: Article

References (11)

1. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, Appl. Phys. Lett. 67, 3114 (1995).
2. T. Ohta, M. Hennessey, D. Strand, D. Jablonski, B. Walton, and B. Clark, Abstracts of the International Nanoimprint and Nanoprint Technology Conference, Nara, 2005 (unpublished), Paper No. 21A-9-2.
3. T. Mäkelä, T. Haatainen, P. Majander, and J. Ahopelto, Abstracts of International Conference on Electron, Ion, Photon Beams and Nanotechnology, Denver, 2007 (unpublished), Paper No. PI-5.
4. Y. Hirai, S. Yoshida, T. Kanakugi, and T. Konishi, J. Vac. Sci. Technol. B 22, 3288 (2004).
5. Y. Hirai, T. Yoshikawa, N. Takagi, and S. Yoshida, J. Photopolym. Sci. Technol. 16, 615 (2003).
6. H. Rowland, W. King, A. Sun, and P. Schunk, J. Vac. Sci. Technol. B 23, 2958 (2005).
7. O. C. Zienkiewicz and R. L. Taylor, The Finite Element Method for Solid and Structural Mechanics, 6th ed. (Elsevier, Oxford, 2005).
8. W. B. Young, Microelectron. Eng. 77, 405 (2005).
9. T. Eriksson and H. K. Rasmussen, J. Non-Newtonian Fluid Mech. 127, 191 (2005).
10. T. A. Osswald and H. L. Menges, Material Science of Polymers for Engineers (Hanser, New York, 1996).
11. M. Williams, R. Landel, and D. Ferry, J. Am. Chem. Soc. 77, 3701 (1955).