Process characterization of inductively coupled plasma etched silicon nanopillars by micro-Raman

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 6, 2007, Pages 2059-2063

  Laws, G M ^a   Handugan, A ^a   Eschrich, T ^a   Boland, P ^a   Sinclair, C ^a   Myhajlenko, S ^a   Poweleit, C D ^b  

^a Arizona State University   (United States)

^b ARIZONA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EDGE ROUGHNESS; NANOPILLAR ARRAYS; SIDEWALL ROUGHNESS;

ELECTRON BEAM LITHOGRAPHY; LINEWIDTH; OXIDATION; RAMAN SPECTROSCOPY; SILICON;

PLASMA ETCHING;

EID: 37149043202     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2781514     Document Type: Article

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