Simple high resolution nanoimprint-lithography

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 937-939

  Haffner M ^a,b   Heeren, A ^a   Fleischer, M ^a   Kern, D P ^a   Schmidt, G ^b   Molenkamp, L W ^b  

^a UNIVERSITY OF TÜBINGEN   (Germany)

^b UNIVERSITY OF WÜRZBURG   (Germany)

Author keywords

High resolution; Hydrogen silsesquioxane; Nanoimprint lithography

Indexed keywords

ELECTRON BEAMS; OPTICAL RESOLVING POWER; SILICON; SPIN COATING;

ELECTRON BEAM PATTERNING; HIGH RESOLUTION; HYDROGEN SILSESQUIOXANE (HSQ); SILICON SUBSTRATES;

NANOIMPRINT LITHOGRAPHY;

COATING; ELECTRON BEAMS; LITHOGRAPHY; RESOLUTION; SILICON;

EID: 34247638016     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.020     Document Type: Article

References (3)

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