Micromechanical resonators with sub-micron capacitive gaps in 2 μm process

Electronics Letters

Volumn 43, Issue 25, 2007, Pages 1427-1428

  Shao, L C ^a   Palaniapan, M ^a   Khine, L ^a   Tan, W W ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROSTATIC ACTUATORS; FABRICATION; RESONATORS;

INNOVATIVE GAP REDUCTION TECHNIQUE; MICROMECHANICAL RESONATORS; SUB-MICRON CAPACITIVE GAPS;

MICROMECHANICS;

EID: 36949011183     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:20072841     Document Type: Article

References (6)

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2. Demirci, M.U., Abdelmoneum, M.A., and Nguyen, C.T.-C.: ' Mechanically corner-coupled square microresonator array for reduced series motional resistance ', Digest of Technical Papers, Transducers'03, 2003, p. 955-958
3. No, S.Y., and Ayazi, F.: ' The HARPSS process for fabrication of nano-precision silicon electromechanical resonators ', Proc. IEEE NANO'01, 2001, p. 489-494
4. Quévy, E.P., Bhave, S.A., Takeuchi, H., King, T.-J., and Howe, R.T.: ' Poly-SiGe high frequency resonators based on lithographic definition of nano-gap lateral transducers ', Technical Digest IEEE Hilton Head, 2004, p. 360-363
5. Senturia, S.D.: ' Microsystem design ', (Kluwer Academic Publishers, 2001)
6. Khine, L., Palaniapan, M., and Wong, W.K.: ' 6MHz bulk-mode resonator with Q values exceeding one million ', Digest of Technical Papers, Transducers'07, 2007, p. 2445-2448