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Volumn 516, Issue 5, 2008, Pages 779-784

Hot wire chemical vapor processing (HWCVP) - A prospective tool for VLSI

Author keywords

Application Specific Integrated Circuits (ASICs); Diffusion barriers; Hot wire chemical vapor process (HWCVP); Micro electro mechanical systems (MEMS)

Indexed keywords

APPLICATION SPECIFIC INTEGRATED CIRCUITS; CHEMICAL VAPOR DEPOSITION; DIFFUSION BARRIERS; ELECTROMIGRATION; MEMS; VLSI CIRCUITS;

EID: 36749085114     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.088     Document Type: Article
Times cited : (6)

References (11)
  • 1
    • 0004292174 scopus 로고
    • Manos D.M., and Flamm D.L. (Eds), Academic Press, Inc., New York
    • In: Manos D.M., and Flamm D.L. (Eds). Plasma Etching (1989), Academic Press, Inc., New York
    • (1989) Plasma Etching
  • 11
    • 36749051288 scopus 로고    scopus 로고
    • H. Rokade, M. Tech. Dissertation, IIT Bombay, 2005.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.