Self-aligned fabrication of single crystal diamond gated field emitter array

Diamond and Related Materials

Volumn 14, Issue 11-12, 2005, Pages 2047-2050

  Yamada, Takatoshi ^a   Vinod, Purayath Robert ^a   Hwang, Doo Sup ^a   Yoshikawa, Hiromichi ^a   Shikata, Shin Ichi ^a   Fujimori, Naoji ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Field emitter array; ICP etching; Lift off; Nano structure; Self aligned process; Sputtering

Indexed keywords

CRYSTALLINE MATERIALS; FINITE ELEMENT METHOD; SILICA; SINGLE CRYSTALS; SPUTTERING;

FIELD EMITTER ARRAY; ICP ETCHING; LIFT-OFF; NANO-STRUCTURE; SELF-ALIGNED PROCESS;

DIAMONDS;

EID: 27744569969     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2005.06.040     Document Type: Conference Paper

References (16)

1. F.J. Himpsel, J.A. Knapp, J.A. VanVechten, and D.E. Eastman Phys. Rev., B 20 1979 624
2. B.B. Pate Sur. Sci. 165 1981 83
3. F. Maier, J. Ristein, and L. Ley Phys. Rev., B 64 2001 165411
4. T. Yamada, A. Sawabe, S. Koizumi, J. Itoh, T. Kamio, and K. Okano Diamond Relat. Mater. 11 2002 257
5. M.W. Geis, J.C. Twichell, J. Macaulay, and K. Okano Appl. Phys. Lett. 67 1996 1328
6. T. Sugino, C. Kimura, K. Kurihara, Y. Yokota, S. Koizumi, and M. Kamo Phys. Status Solidi A, Appl. Res. 174 1999 145
7. K. Okano, K. Hoshina, M. Iida, S. Koizumi, and T. Inuzuka Appl. Phys. Lett. 64 1994 2742
8. A. Wisitsora-at, W.P. Kang, J.L. Davidson, C. Li, D.V. Kerns, and M. Howell J. Vac. Sci. Technol., B 21 2003 1665
9. W.K. Dike, and W.W. Dolan Adv. Electron. Electron. Phys. 8 1956 89
10. Y. Nishibayashi, Y. Ando, H. Saito, T. Imai, T. Hirao, and K. Oura Diamond Relat. Mater. 10 2001 1732
11. T. Yamada, D.-S. Hwang, P.R. Vinod, and N. Fujimori Jpn. J. Appl. Phys. 44 2005 L385
12. M. Nagao, D. Nicolaescu, T. Matsukawa, S. Kanemaru, J. Itoh, K. Koga, T. Kawase, K. Honda, and T. Norikane J. Vac. Sci. Technol., B 21 2003 1581
13. H. Shimawaki, S. Shibuya, H. Mimura, and K. Yokoo J. Vac, Sci, Technol., B 41 2003 1594
14. C.Y. Chang S.M. Sze ULSI Technology 1996 The McGraw-Hill Companies, Inc. New York
15. T. Yamada, H. Ishihara, K. Okano, S. Koizumi, and J. Itoh J. Vac. Sci, Technol., B 15 1997 1678
16. T. Yamada, A. Sawabe, S. Koizmu, J. Itoh, and K. Okano Appl. Phys. Lett. 76 2000 1297