Structural and mechanical properties of dc and pulsed dc reactive magnetron sputtered V2O5 films

Journal of Physics D: Applied Physics

Volumn 40, Issue 24, 2007, Pages 7716-7719

  Fateh, N ^a   Fontalvo, G A ^a   Mitterer, C ^a  

^a UNIVERSITY OF LEOBEN   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; VANADIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

POLYCRYSTALLINE GROWTH; ROOM TEMPERATURE; STRUCTURAL CHARACTERISTICS; SUBSTRATE TEMPERATURE;

THIN FILMS;

EID: 36749015194     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/40/24/019     Document Type: Article

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