Differences in the structure composition of microcrystalline silicon solar cells deposited by HWCVD and PECVD: Influence on open circuit voltage

Thin Solid Films

Volumn 501, Issue 1-2, 2006, Pages 272-275

  Mai, Y ^a,b   Klein, S ^a   Geng, X ^b   Hulsbeck M ^a   Carius, R ^a   Finger, F ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b NANKAI UNIVERSITY   (China)

Author keywords

Hot wire chemical vapor deposition; Open circuit voltage; PECVD; Solar cells

Indexed keywords

COMPOSITION; CRYSTALLINE MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON;

HOT-WIRE CHEMICAL VAPOR DEPOSITION; OPEN CIRCUIT VOLTAGE;

SOLAR CELLS;

EID: 32644452908     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.193     Document Type: Conference Paper

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