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Volumn , Issue , 2002, Pages 139-142

Understanding nMOSFET characteristics after soft breakdown and their dependence on the breakdown location

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTION PATHS; DEVICE SIMULATORS; ELECTRON ENERGIES; GATE OXIDE; HARD BREAKDOWN; NMOSFET; SOFT BREAKDOWN; STATIC BEHAVIORS;

EID: 36549080204     PISSN: 19308876     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ESSDERC.2002.194889     Document Type: Conference Paper
Times cited : (13)

References (14)
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  • 3
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    • (2001) IEDM Tech. Dig. , pp. 117-120
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  • 5
    • 0036494130 scopus 로고    scopus 로고
    • Consistent model for short-channel nMOSFET after hard gate oxide breakdown
    • B. Kaczer et al., "Consistent model for short-channel nMOSFET after hard gate oxide breakdown", IEEE T. Electron Dev. 49, 2002, pp. 507-513;
    • (2002) IEEE T. Electron Dev. , vol.49 , pp. 507-513
    • Kaczer, B.1
  • 6
    • 0036494245 scopus 로고    scopus 로고
    • Impact of MOSFET gate oxide breakdown on digital circuit operation and reliability
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  • 7
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    • accepted to
    • F. Crupi, B. Kaczer, R. Degraeve, A. De Keersgieter, G. Groeseneken, "Location and hardness of the oxide breakdown in short channel n- and p-MOSFETs", accepted to IRPS 2002.
    • (2002) IRPS
    • Crupi, F.1    Kaczer, B.2    Degraeve, R.3    De Keersgieter, A.4    Groeseneken, G.5
  • 8
    • 0035393201 scopus 로고    scopus 로고
    • Wear-out, breakdown occurrence and failure detection in 18-25 angstrom ultrathin oxides
    • F. Monsiuer et al., "Wear-out, breakdown occurrence and failure detection in 18-25 angstrom ultrathin oxides", Microelectron. Reliab. 41, 2001, pp. 1035-1039.
    • (2001) Microelectron. Reliab. , vol.41 , pp. 1035-1039
    • Monsiuer, F.1
  • 9
    • 33747905416 scopus 로고    scopus 로고
    • Relation between breakdown mode and location in short-channel nMOSFETs and its impact on reliability specifications
    • R. Degraeve, B. Kaczer, A. De Keersgieter, G. Groeseneken, "Relation between breakdown mode and location in short-channel nMOSFETs and its impact on reliability specifications", IEEE T. Dev. Mat. Reliab. 1, 2001, pp. 163-169.
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  • 10
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    • Post-softbreakdown characteristics of deep submicron nMOSFETs with ultrathin gate oxide
    • M.-Y. Tsai, H.-C. Lin, D.-Y. Lee, and T.-Y. Huang, "Post-softbreakdown characteristics of deep submicron nMOSFETs with ultrathin gate oxide", IEEE Electron Dev. Lett. 22, 2001, pp. 348-350.
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    • Tsai, M.-Y.1    Lin, H.-C.2    Lee, D.-Y.3    Huang, T.-Y.4
  • 11
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  • 12
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  • 13
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  • 14
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.