Comparison of LiNbO3 flux systems for deposition on RIE-etched LiTaO3 substrates

Journal of Physics D: Applied Physics

Volumn 40, Issue 23, 2007, Pages 7480-7484

  Marshall, J M ^a   Walker, D ^a   Thomas, P A ^a   Dobedoe, R S ^a   Ren, Z ^b   Yu, S ^b  

^a UNIVERSITY OF WARWICK   (United Kingdom)

^b UNIVERSITY OF BRISTOL   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; FILM GROWTH; LIQUID PHASE EPITAXY; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; THIN FILMS; X RAY DIFFRACTION;

COMPOSITION CHANGE; DETECTION LIMITS; FLUX SYSTEMS; SUITABILITY;

LITHIUM COMPOUNDS;

EID: 36349023162     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/40/23/034     Document Type: Article

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