Etching characteristics of LiNbO3 crystal by fluorine gas plasma reactive ion etching

Surface and Coatings Technology

Volumn 169-170, Issue , 2003, Pages 203-207

  Tamura, Masashi ^a   Yoshikado, Shinzo ^a  

^a DOSHISHA UNIVERSITY   (Japan)

Author keywords

Atomic force microscopy method; Crystallinity; Etched surface; LiNbO3; Plasma reactive ion etching method; X ray photoelectron spectroscopy method

Indexed keywords

FLUORINE; GASES; LITHIUM NIOBATE; REACTIVE ION ETCHING; SURFACE PROPERTIES; THERMAL EFFECTS;

ETCHING CHARACTERISTICS;

SINGLE CRYSTALS;

COATING; ETCHING; PLASMA TREATMENT; SURFACE TREATMENT;

EID: 0037793112     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00070-7     Document Type: Article

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