Pellicle factors affecting finished photomask flatness

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6607, Issue PART 2, 2007, Pages

  Racette, K ^a   Watts, A ^a   Barrett, M ^a   Nolan, R ^a   Sasaki, Y ^b   Kikuchi, Y ^b   Matsumura, T ^b  

^a IBM   (United States)

^b Toppan Electronics ^*  (Japan)

Author keywords

Pellicle; Pellicle adhesive; Pellicle frame; Photomask flatness

Indexed keywords

ADHESIVES; PATTERN RECOGNITION;

FRAME FLATNESS; MOUNTING TOOL; PELLICLE ADHESIVES; PELLICLE FRAME; PHOTOMASK BLANK FLATNESS;

PHOTOMASKS;

EID: 36249025229     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.728978     Document Type: Conference Paper

References (4)

1. K. Racette, M. Barrett, M. Hibbs, and M. Levy, The Effect of Mask Substrate and Mask Process Steps on Patterned Photomask Flatness, SPIE, Vol 5752, pp. 621-630, 2005.
2. C. Lee, K. Racette and M. Barrett, Investigation of Pellicle Influence on Reticle Flatness, SPIE, Vol 5853, pp. 516-524, 2005.
3. E. Cotte, R. Engelstad, E. Lovell, D. Tanzil, F. Eschbach, Y. Korobko, M. Fujita, H. Nakagawa, Effects of Soft Pellicle Frame Curvature and Mounting Process On Pellicle-Induced Distortions in Advanced Photomasks, SPIE, Vol 5040, pp. 1044-1054, 2003.
4. R. Wistrom, D. Hayden, K. Racette, M. Barrett, A. Watts, "Influence of Pellicle on Final Photomask Flatness ", Proc. SPIE 6283-39, 2006.