The effect of mask substrate and mask process steps on patterned photomask flatness

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5752, Issue II, 2005, Pages 621-631

  Racette, Kenneth ^a   Barrett, Monica ^a   Hibbs, Michael ^a   Levy, Max ^a  

^a NONE

Author keywords

Flatness; Mask; Mask blank; Mask flatness; Pellicle; Substrate

Indexed keywords

CHROMIUM; COATINGS; PHASE SHIFTERS; POLISHING; QUARTZ;

FILM DEPOSITION; MASK PATTERNING; PHOTOMASK FABRICATION; RESIST COATINGS;

MASKS;

EID: 24644455479     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599598     Document Type: Conference Paper

References (4)

1. W. Chen, J. Carroll, G. Storm, R. Ivancich, J. Maloney, O.Maurin, E. Souleillet, "Pellicle-Induced Reticle Distortion: An Experimental Investigation, Proc. SPIE, 3665, 123-128, 1999
2. E.Cotte, R. Engelstad, E. Lovell, D. Tanzil, F. Eschbach, E. Shu, "Experimental and Numerical Studies of the Effects of Materials and Attachment on Pellicle-Induced Distortions in Advanced Photomasks", Proc. SPIE, 4754, 579-588, 2002
3. M. Fujita, M. Akiyama, M. Kondo, H. Nakagawa, D. Tanzil, F. Eschbach, E. Cotte, R. Engelstad, E. Lovell", "Pellicle-Induced Distortions in Advanced Photomasks", Proc. SPIE, 4754, 589-596, 2002
4. E.Cotte, R. Engelstad, E. Lovell, D. Tanzil, F. Eschbach, Y. Korobko, M. Fujita, H. Nakagawa, "Effects of Soft Pellicle Frame Curvature and Mounting Process on Pellicle-Induced Distortions in Advanced Photomasks", Proc. SPIE, 5040, 1044-1054, 2003