Investigation of pellicle influence on reticle flatness

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5853 PART I, Issue , 2005, Pages 516-524

  Lee, Christopher ^a   Racette, Kenneth ^b   Barrett, Monica ^b  

^a Corning Tropel Corporation ^*  (United States)

^b IBM MICROELECTRONICS   (United States)

Author keywords

Depth of focus; Flatness; Mask blank; Pellicle; Photomask; Reticle

Indexed keywords

CORRELATION METHODS; MASKS; OPTICAL RESOLVING POWER;

DEPTH OF FOCUS; FLATNESS; MASK BLANK; PELLICLE; PHOTOMASKS; RETICLE;

PHOTOLITHOGRAPHY;

EID: 28544432840     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.617120     Document Type: Conference Paper

References (3)

1. K. Racette, M. Barrett, M. Hibbs, M. Levy "The Effects of Mask Substrate and Mask Process Steps on Pattterned Photomask Flatness", SPIE Microlithography Conference 2005, in press.
2. C. Lee, A. Kulawiec, M. Tronolone, Y Nakamura, T. Murakami "Method for Measuring Reticles With Pellicles Mounted", Proc. SPIE Int. Soc. Opt. Eng. 5446, 770 (2004)
3. M. Itoh, S. Inoue, "Influence of Pellicle Mounting to Predicted Mask Flatness", EMLC 2005, in press