Influence of the pellicle on final photomask flatness

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6283 II, Issue , 2006, Pages

  Wistrom, Richard ^a   Hayden, Dennis ^a   Racette, Kenneth ^a   Barrett, Monica ^a   Watts, Andrew ^a  

^a IBM   (United States)

Author keywords

Adhesive; Frame; Mask flatness; Pellicle

Indexed keywords

ADHESIVES; MANUFACTURE; OPTICAL PROPERTIES;

FRAME; MASK FLATNESS; PELLICLE;

PHOTOLITHOGRAPHY;

EID: 33748041134     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.681775     Document Type: Conference Paper

References (3)

1. K. Racette, M. Barrett, M. Hibbs, and M. Levy, The Effect of Mask Substrate and Mask Process Steps on Patterned Photomask Flatness, SPIE, Vol 5752, pp. 621-630, 2005.
2. C. Lee, K. Racette and M. Barrett, Investigation of Pellicle Influence on Reticle Flatness, SPIE, Vol 5853, pp. 516-524, 2005.
3. E. Cotte, R. Engelstad, E. Lovell, D. Tanzil, F. Eschbach, Y. Korobko, M. Fujita, H. Nakagawa, Effects of Soft Pellicle Frame Curvature and Mounting Process On Pellicle-Induced Distortions in Advanced Photomasks, SPIE, Vol 5040, pp. 1044-1054, 2003.