Measurement tool influence on CD results on photolithographic masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6283 I, Issue , 2006, Pages

  Richter, Jan ^a   Liebe, Roman ^a   Laske, Frank ^a   Rudolf, Jens ^a   Heins, Torben ^a  

^a Advanced Mask Technology Center GmbH and Co KG   (Germany)

Author keywords

Calibration; CD standard; Critical dimensions; Cross calibration; Metrology; Photo lithographic masks; Reproducibility

Indexed keywords

ATOMIC FORCE MICROSCOPY; CALIBRATION; EDGE DETECTION; OPTICAL VARIABLES MEASUREMENT; PATTERN MATCHING; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY;

CRITICAL DIMENSION (CD)-STANDARD; CROSS CALIBRATION; PHOTOLITHOGRAPHIC MASKS; REPRODUCIBILITY;

MASKS;

EID: 33748085017     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.681867     Document Type: Conference Paper

References (7)

1. International Technology Roadmap for Semiconductors (ITRS), 2005 Edition, Lithography.
2. W. Häßler-Grohne, T. Dziomba, C.G. Frase, H. Bosse, J. Prochazka,Characterization of a 100 nm ID pitch standard by metrological SFM, and SFM, Proc. SPIE 5375, 426-436 (2004).
3. W. Mirandé, C.G. Frase, Comparison of Linewidth Measurements on Si Structures performed by Atomic Force Microscopy (AFM) and low Voltage Scanning Electron Microscopy (SEM), Proceedings Quantitative Microscopy (QM '99), Kopenhagen, 1999, PTB-Bericht PTB-F-34, 89-96 (1999).
4. W. Häßler-Grohne, C.G. Frase, K. Hahm, H. Bosse, Analysis and comparison of CD-SEM edge operators; a contribution to feature width metrology, Conf. Proc. Nanoscale 2004, Braunschweig.
5. B. Bodermann, E. Buhr, W. Mirandé, Quantitative Mikroskopie: Dimensionelle Messtechnik an Mikro- und Nanostrukturen, PTB Mitteilungen 113, 4, 9-17 (2003) (in German).
6. F. Gans et al., Results of a round robin measurement on a new CD mask standard, Proc. 21th EMC, GMM-Fachbericht 45, 109-120 (2005).
7. F. Gans et al., Systematic investigation of CD metrology response to sidewall profile variation on a COG test mask, presented at EMC, in print.