XUV laser-plasma source based on solid Ar filament

Review of Scientific Instruments

Volumn 78, Issue 10, 2007, Pages

  Peth, Christian ^a   Kalinin, Anton ^a   Barkusky, Frank ^a   Mann, Klaus ^a   Peter Toennies, J ^b   Rusin, Lev Yu ^c  

^a LASER LABORATORIUM GÖTTINGEN E V   (Germany)

^b MAX PLANCK INSTITUTE FOR DYNAMICS AND SELF ORGANIZATION   (Germany)

^c SEMENOV INSTITUTE OF CHEMICAL PHYSICS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; LASER APPLICATIONS; LIGHT EMISSION; PARAMETER ESTIMATION; PLASMA WAVES; X RAY ANALYSIS;

ARGON PLASMA; SENSITIVE PINHOLE CAMERAS; SPECTRAL RANGE;

LASER PRODUCED PLASMAS;

ARGON;

ARTICLE; CHEMISTRY; ELECTRODE; EQUIPMENT; EQUIPMENT DESIGN; HEATING; INSTRUMENTATION; LASER; METHODOLOGY; REPRODUCIBILITY; SENSITIVITY AND SPECIFICITY; ULTRAVIOLET SPECTROPHOTOMETRY; X RAY;

ARGON; ELECTRODES; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; HEATING; LASERS; REPRODUCIBILITY OF RESULTS; SENSITIVITY AND SPECIFICITY; SPECTROPHOTOMETRY, ULTRAVIOLET; X-RAYS;

EID: 36049006222     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2801882     Document Type: Article

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